Universitätsbibliothek
Universitätsbibliographie

Ergebnis der Datenbankabfrage

Nr. Titel Autor Jahr
1 Atomic layer deposition of ultrathin Cu2O and subsequent reduction to Cu studied by in situ x-ray photoelectron spectroscopy Dhakal, Dileep et al. 2016
2 Half-sandwich cobalt complexes in the metal-organic chemical vapor deposition process Georgi, Colin et al. 2015
3 In-situ XPS Investigation of ALD Cu2O and Cu Thin Films after Successive Reduction Dhakal, Dileep et al. 2014
4 In-situ XPS Investigation of the Surface Chemistry of a Cu(I) Beta-Diketonate Precursor and the ALD of Cu2O Dhakal, Dileep et al. 2014
5 Surface chemistry of a Cu(I) beta-diketonate precursor and the atomic layer deposition of Cu2O on SiO2 studied by x-ray photoelectron spectroscopy Dhakal, Dileep et al. 2014
6 ALD of Transition Metals and Metal Oxides for Applications in Electronics and Sensor Devices Waechtler, Thomas et al. 2013
7 Copper oxide atomic layer deposition on thermally pretreated multi-walled carbon nanotubes for interconnect applications Melzer, Marcel et al. 2013
8 Enhancement of the thermoelectric properties of PEDOT:PSS thin films by post-treatment Luo, Jinji et al. 2013
9 Low resistance carbon nanotube - metal contact for interconnect applications Fiedler, Holger et al. 2013
10 Magneto-optical Kerr effect studies of Cu2O/nickel heterostructures Salvan, Georgeta et al. 2013
11 Distinguishing between Individual Contributions to the Via Resistance in Carbon Nanotubes Based Interconnects Fiedler, Holger* et al. 2012
12 FIB/SEM Analysis for Smart Systems Integration Waechtler, Thomas et al. 2012
13 Magneto-optical Kerr-effect studies on copper oxide thin films produced by atomic layer deposition on SiO2 Fronk, Michael et al. 2012
14 Ruthenocenes and Half-Open Ruthenocenes: Synthesis, Characterization, andTheir Use as CVD Precursors for Ruthenium Thin Film Deposition Tuchscherer, André et al. 2012
15 Variation of the growth behavior of copper oxide deposited via ALD on thermally pretreated CNTs Melzer, Marcel et al. 2012
16 ALD-grown seed layers for electrochemical copper deposition integrated with different diffusion barrier systems. Waechtler, Thomas et al. 2011
17 An approach for Cu ALD via reduction of ruthenium-containing CuxO films for the metallization in spintronic and ULSI interconnect systems Mueller, Steve et al. 2011
18 Copper ALD for Applications in ULSI Metallization Systems and Spintronic Layer Stacks. Waechtler, Thomas et al. 2011
19 Copper films grown via copper oxide ALD integrated with different liner materials for interconnect applications Waechtler, Thomas et al. 2011
20 Magneto-optical Kerr-effect studies on copper oxide thin films produced by atomic layer deposition on SiO2 Fronk, M. et al. 2011
Aktuelle Seite:
Anzahl der Ergebnisseiten: 2
Anzahl der Dokumente: 33

TUCaktuell

Soziale Medien

Verbinde dich mit uns: