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Nr. Titel Autor Jahr
1 A Methodology for Validation of DNA Origami-Quantum Dot Hybridization Janßen, Mathis* et al. 2025
2 Comparison of two types of silicon nitride grating couplers for 1550nm wavelength with slots and square holes and different deposition methods Schumann, Anne-Katrin* et al. 2025
3 Development of an intra-level mix-and-match lithography process using negative-tone photoresist AR-N 4400-10 S4 to combine i-line stepper and electron beam exposure Gottwald, Markus* et al. 2025
4 DNA Origami Based Approach for an Electrically Driven Single-Photon Source for Contaminant Detection in Water Hann, Julia et al. 2025
5 Evaluation of HSQ resist Medusa 84 SiH regarding suitability for various process windows Kohlschreiber, Pia et al. 2025
6 Investigations of storage stability for DNA origami in water and defect analysis Janßen, Mathis et al. 2025
7 Nanolithographic waveguides, couplers and ring resonators made of Si3N4 and AlN for photonics and quantum technologies Wecker, Julia* et al. 2025
8 Optical Emission Spectroscopy Analysis of the BOSCH Process Utilizing k-Means Clustering and Dynamic Mode Decomposition Seifert, Tom* et al. 2025
9 Optimizing reticle based high throughput i-line grayscale projection lithography for 3D structures with low surface roughness Schermer, S.* et al. 2025
10 Optomechanical Inertial Sensors Based on Ring Resonators: Design Approaches and Technology Shaporin, Alexey et al. 2025
11 2.5D-patterning via i-line grayscale exposure for photonic structures and micro lens arrays Schermer, Sebastian et al. 2024
12 A New Phase Diagram for Fluid Invasion Patterns as a Function of Pore-Scale Heterogeneity, Surface Roughness, and Wettability Geistlinger, Helmut* et al. 2024
13 About the Data Analysis of Optical Emission Spectra of Reactive Ion Etching Processes—The Method of Spectral Redundancy Reduction Haase, Micha* et al. 2024
14 Aluminum-nitride-based modular photonic integrated circuit technology and characterization platform (PIC-TCP) Tank, Franz et al. 2024
15 Characterization of negative tone photoresist mr-EBL 6000.5 for i-line stepper and electron beam lithography for the Intra-Level Mix & Match Approach Schermer, Sebastian* et al. 2024
16 Combining nano-scale imprint lithography and reactive ion etching to fabricate high-quality surface relief gratings Haase, Micha et al. 2024
17 Evaluation of Thin Pd Layers for a Sensor System Monitoring Anode-Side Hydrogen Concentration in a Fuel Cell Bickmann, Christopher et al. 2024
18 Fabrication of switchable biocompatible, nano-fluidic devices using a thermoresponsive polymer on nano-patterned surfaces Bickmann, Christopher* et al. 2024
19 Impact of Dielectric Types on Surface Topography for Wafer-Level Hybrid Bonding Dubey, Vikas* et al. 2024
20 Molecular approach to semiconductors: a shift towards ecofriendly manufacturing and neuroinspired interfaces Monakhov, Kirill Yu.* et al. 2024
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Anzahl der Dokumente: 113

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