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Nr.	Titel	Autor	Jahr
1	A Multi-Model Dataset for BOSCH Plasma-Etching: Optical Emission Spectra, Process Parameters, and Wafer Measurements for Data-Driven Plasma Modeling	Sayyed, Mudassir Ali et al.	2025
2	Hybrid Spectral Data Compression for Efficient and Interpretable Bosch Process Monitoring	Sayyed, Mudassir Ali et al.	2025
3	Nanolithographic waveguides, couplers and ring resonators made of Si3N4 and AlN for photonics and quantum technologies	Wecker, Julia* et al.	2025
4	Optical Emission Spectroscopy Analysis of the BOSCH Process Utilizing k-Means Clustering and Dynamic Mode Decomposition	Seifert, Tom* et al.	2025
5	About the Data Analysis of Optical Emission Spectra of Reactive Ion Etching Processes—The Method of Spectral Redundancy Reduction	Haase, Micha* et al.	2024
6	Combining nano-scale imprint lithography and reactive ion etching to fabricate high-quality surface relief gratings	Haase, Micha et al.	2024
7	Impact of Dielectric Types on Surface Topography for Wafer-Level Hybrid Bonding	Dubey, Vikas* et al.	2024
8	Navigating Complex Process and Design Challenges in Hybrid Bonding for Advanced Semiconductor Integration: A Comprehensive Analysis	Dubey, Vikas* et al.	2024
9	Real-Time End Point Detection via Automated Dynamic Mode Decomposition	Sayyed, Mudassir Ali* et al.	2024
10	Scalable fabrication approach and fill factor optimization for single pixel microlens arrays	Bonitz, Jens* et al.	2024
11	Impact of Dielectric and Copper Via Design on Wafer-to-Wafer Hybrid Bonding	Dubey, Vikas* et al.	2023
12	Integration of (Poly-Si/Air)n Distributed Bragg Reflectors in a 150 mm Bulk Micromachined Wafer-Level MOEMS Fabrication Process	Helke, Christian* et al.	2023
13	Measuring Ion Energy Distributions by Retarding Field Energy Analyzer and Using Low-Energy Ions for Si-ALE by Cl2	Dittmar, Nils et al.	2023
14	Fabrication of Nanoimprint-Lithography masters for optical nano gratings	Helke, Christian et al.	2022
15	Hochauflösende Projektions-Lithografie für die Herstellung von MEMS-Strukturen mit hohem Aspekt-Verhältnis und für Nano-Imprint-Lithografie Mastern für optische Gitter	Schermer, Sebastian et al.	2022
16	On the Fabrication and Characterization of Polymer-Based Waveguide Probes for Use in Future Optical Cochlear Implants	Helke, Christian* et al.	2022
17	On the relationship between SiF4 plasma species and sample properties in ultra low-k etching processes	Haase, Micha* et al.	2020
18	The role of plasma analytics in leading‐edge semiconductor technologies	Zimmermann, Sven* et al.	2018
19	Requirements and challenges on an alternative indirect integration regime of low-k materials	Haase, Micha et al.	2016

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Anzahl der Ergebnisseiten:	1
Anzahl der Dokumente:	19