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Nr. Titel Autor Jahr
1 Development of a Cobalt Atomic Layer Deposition Process using Co2(CO)6HC=CC5H11 as Precursor Franz, Mathias* et al. 2023
2 Modeling the temporal evolution and stability of thin evaporating films for wafer surface processing Huber, Max et al. 2023
3 Chemical Mechanism of AlF3 Etching during AlMe3 Exposure: A Thermodynamic and DFT Study Hu, Xiao* et al. 2022
4 Modeling the temporal evolution and stability of thin evaporating films for wafer surface processing Huber, Max* et al. 2022
5 Cover Feature: Ferrocenyl-Pyrenes, Ferrocenyl-9,10-Phenanthrenediones, and Ferrocenyl-9,10-Dimethoxyphenanthrenes: Charge-Transfer Studies and SWCNT Functionalization (Chem. Eur. J. 12/2020) Preuß, Andrea et al. 2020
6 Ferrocenyl-Pyrenes, Ferrocenyl-9,10-Phenanthrenediones, and Ferrocenyl-9,10-Dimethoxyphenanthrenes: Charge-Transfer Studies and SWCNT Functionalization Preuß, Andrea et al. 2020
7 Multiscale Simulation of Metallic Copper and Copper Oxide Atomic Layer Deposition from Cu Beta-diketonates Hu, Xiao 2018
8 Multiparameter and Parallel Optimization of ReaxFF Reactive Force Field for Modeling the Atomic Layer Deposition of Copper Hu, Xiao* et al. 2017
9 Growth Monitoring by XPS and LEIS Investigations of Ultrathin Copper Films Deposited by Atomic Layer Deposition Dhakal, Dileep et al. 2015
10 Reactive Molecular Dynamics Study of Copper Metal and Copper Oxide Atomic Layer Deposition from Copper(II) Acetylacetonate Hu, Xiao* et al. 2015
11 Simulation of ALD chemistry of (nBu3P)2Cu(acac) and Cu(acac)2 precursors on Ta(110) surface Hu, Xiao et al. 2015
12 Surface chemistry of copper metal and copper oxide atomic layer deposition from copper(II) acetylacetonate: a combined first-principles and reactive molecular dynamics study Hu, Xiao* et al. 2015
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