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Universitätsbibliographie

Universitätsbibliographie | Universitätsbibliothek | TU Chemnitz

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Nr.	Titel	Autor	Jahr
1	Challenges of Current and Future Advanced Interconnect Systems for Integrated Circuits	Schulz, Stefan E. et al.	2014
2	ALD of Transition Metals and Metal Oxides for Applications in Electronics and Sensor Devices	Waechtler, Thomas et al.	2013
3	Benetzungsoptimierte Reinigungslösungen für die Entfernung von Plasmaätzresiduen für die Anwendung im Verdrahtungssystem integrierter Schaltungen	Ahner, Nicole	2013
4	A Low Damage Patterning Scheme for Ultra Low-k Dielectrics	Zimmermann, Sven et al.	2012
5	Optimized Wetting Behavior of Water-Based Cleaning Solutions for Plasma Etch Residue Removal by Application of Surfactants	Ahner, Nicole et al.	2012
6	A less damage patterning regime for a successful integration of ultra low-k materials in modern nanoelectronic devices	Zimmermann, Sven* et al.	2011
7	Influence of thermal cycles on the silylation process for recovering k-value and chemical structure of plasma damaged ultra-low-k materials	Fischer, Tobias et al.	2011
8	Analysis of the impact of different additives during etch processes of dense and porous low-k with OES and QMS	Zimmermann, Sven et al.	2010
9	Improvement of etch processes for SiCOH materials with novel in situ diagnostic and evaluation methods	Zimmermann, Sven et al.	2010
10	Influence of the additives argon, O2, C4F8, H2, N2 and CO on plasma conditions and process results during the etch of SiCOH in CF4 plasma	Zimmermann, Sven et al.	2010
11	Influence of thermal cycles on the silylation process for recovering k-value and chemical structure of plasma damaged ultra-low-k materials (Talk)	Fischer, Tobias et al.	2010
12	Surface energy and wetting behaviour of plasma etched porous SiCOH surfaces and plasma etch residue cleaning solutions.	Ahner, Nicole et al.	2009

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Anzahl der Dokumente:	12