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Nr. Titel Autor Jahr
1 Statistical Studies on Random Configurations of Silicon Germanium Carbon Alloys Using Density Functional Theory Fuchs, Florian* et al. 2025
2 A Mechanical-Electrical Model to Describe the Negative Differential Resistance in Membranotronic Devices Huber, Max et al. 2024
3 Modeling the temporal evolution and stability of thin evaporating films for wafer surface processing Huber, Max* et al. 2024
4 Stoichiometry fluctuations and geometrical confinement in random alloys: a case study on SiGe:C Dick, Daniel et al. 2024
5 Surface chemistry models for low temperature Si epitaxy process simulation in a single-wafer reactor Jäckel, Linda* et al. 2024
6 Towards lightweight conductors: Improving the conductivity in graphitic films by transition metal additives Niemann, Leonhard* et al. 2024
7 Trisodium Citrate-Assisted Synthesis of Edge-Abundant Nickel-Iron Layered Double Hydroxides for Efficient Oxygen Evolution Reaction Qu, Jiang* et al. 2024
8 An extended Hueckel theory parameterization of Germanium for doped SiGe alloys Dick, Daniel et al. 2023
9 Atomistic and network models for graphene based macromaterials: role of intercalation, defects and dopants Fuchs, Florian et al. 2023
10 Automatic Detection of Via Arrays in AFM Images for CMP Dishing Evaluation Zienert, Andreas* et al. 2023
11 Electronic structure simulation of thin silicon layers: Impact of orientation, confinement, and strain Joseph, Thomas et al. 2023
12 Investigating the influence of stoichiometry-fluctuations on the electronic properties of ultra-scaled HBTs Dick, Daniel et al. 2023
13 Modeling a Wet Wafer Surface Processing Chain Huber, Max* et al. 2023
14 Modeling the temporal evolution and stability of thin evaporating films for wafer surface processing Huber, Max et al. 2023
15 Multi-scale simulation of epitaxial processes Jäckel, Linda* et al. 2023
16 Quantum transport in graphene nanoribbon networks: complexity reduction by a network decimation algorithm Rodemund, Tom Simon* et al. 2023
17 Towards knowledge-enhanced process models for semiconductor fabrication Rothe, Tom et al. 2023
18 A Hybrid Chemical Mechanical Planarization (CMP) Model for Time-Dependent, Spatial Material Removal Rate Optimization Rothe, Tom* et al. 2022
19 Chemical Mechanism of AlF3 Etching during AlMe3 Exposure: A Thermodynamic and DFT Study Hu, Xiao* et al. 2022
20 Modeling the temporal evolution and stability of thin evaporating films for wafer surface processing Huber, Max* et al. 2022
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