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Nr.	Titel	Autor	Jahr
1	Development of an intra-level mix-and-match lithography process using negative-tone photoresist AR-N 4400-10 S4 to combine i-line stepper and electron beam exposure	Gottwald, Markus* et al.	2025
2	Nanolithographic waveguides, couplers and ring resonators made of Si3N4 and AlN for photonics and quantum technologies	Wecker, Julia* et al.	2025
3	2.5D-patterning via i-line grayscale exposure for photonic structures and micro lens arrays	Schermer, Sebastian et al.	2024
4	Aluminum-nitride-based modular photonic integrated circuit technology and characterization platform (PIC-TCP)	Tank, Franz et al.	2024
5	Characterization of negative tone photoresist mr-EBL 6000.5 for i-line stepper and electron beam lithography for the Intra-Level Mix & Match Approach	Schermer, Sebastian* et al.	2024
6	Scalable fabrication approach and fill factor optimization for single pixel microlens arrays	Bonitz, Jens* et al.	2024
7	Development of an e-beam/i-line stepper intra-level mix and match approach with the photoresist mr-EBL 6000.5 for PIC related structures such as waveguides, ring resonators and coupling structures	Reinhardt, Markus et al.	2023
8	Impact of Dielectric and Copper Via Design on Wafer-to-Wafer Hybrid Bonding	Dubey, Vikas* et al.	2023
9	Intra-level mix and match lithography with electron beam lithography and i-line stepper combined with resolution enhancement for structures below the CD-limit	Helke, Christian* et al.	2023
10	High-resolution projection lithography for MEMS-applications using thick photoresist AZ 10XT	Schermer, Sebastian et al.	2022
11	Hochauflösende Projektions-Lithografie für die Herstellung von MEMS-Strukturen mit hohem Aspekt-Verhältnis und für Nano-Imprint-Lithografie Mastern für optische Gitter	Schermer, Sebastian et al.	2022

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Anzahl der Ergebnisseiten:	1
Anzahl der Dokumente:	11