Ergebnis der Datenbankabfrage
| Nr. | Titel | Autor | Jahr |
|---|---|---|---|
| 1 | ALD-grown seed layers for electrochemical copper deposition integrated with different diffusion barrier systems. | Waechtler, Thomas et al. | 2011 |
| 2 | The Inhibition of Enhanced Cu Oxidation on Ruthenium/Diffusion Barrier Layers for Cu Interconnects by Carbon Alloying into Ru | Ding, Shao-Feng et al. | 2011 |
| 3 | Texture analysis on CrSi2: Combining statistical and microscopical information | Schletter, Herbert et al. | 2008 |
| 4 | Electron Microscopy on Axiotaxy of CrSi2 on Si(001) from the micrometer to the Angstrom scale | Falke, Meiken et al. | 2007 |
| Anzahl der Ergebnisseiten: | 1 |
| Anzahl der Dokumente: | 4 |
