Eintrag in der Universitätsbibliographie der TU Chemnitz
Wächtler, Thomas ; Gessner, Thomas ; Schulz, Stefan ; Lang, Heinrich ; Jakob, Alexander
Substrate Having a Coating Comprising Copper and Method for the Production thereof by means of Atomic Layer Deposition
Kurzfassung in englisch
The invention relates to a method for producing a coated substrate having a coating made of copper or a coating comprising copper by means of atomic layer disposition (ALD). To this end, a fluorine-free copper (I) complex of the formula L2Cu (XnX) is used as a copper precursor, wherein L is a s donor/p acceptor or a s,p donor/p acceptor ligand and wherein XnX is a bidentate ligand, namely a ss-diketonate, a ss-ketoiminate, a ss-diiminate, and amidinate, a carboxylate, or a thiocarboxylate. A smooth ALD coating (2) containing copper is obtained on tantalum nitride (3).
| Universität: | Technische Universität Chemnitz | |
| Institut: | Professur Anorganische Chemie | |
| Dokumentart: | Patent (Offenlegungsschrift, Patentschrift, Gebrauchsmusterschrift) | |
| Veröffentlichungsnummer: | WO2009071076(A1) | |
| Veröffentlichungsdatum | 11.06.2009 | |
| Internationale Patentklassifikation | C23C16/18; C23C16/40; C23C16/455; H01L21/768; C23C16/18; C23C16/40; C23C16/455; H01L21/70 |
