Ergebnis der Datenbankabfrage
| Nr. | Titel | Autor | Jahr |
|---|---|---|---|
| 1 | 2.5D-patterning via i-line grayscale exposure for photonic structures and micro lens arrays | Schermer, Sebastian et al. | 2024 |
| 2 | Intra-level mix and match lithography with electron beam lithography and i-line stepper combined with resolution enhancement for structures below the CD-limit | Helke, Christian* et al. | 2023 |
| 3 | Lithographic performance of resist ma-N 1402 in an e-beam/i-line stepper intra-level mix and match approach | Canpolat-Schmidt, Cansu Hanim et al. | 2022 |
| 4 | Novel negative tone spray-coatable photoresist for photolithography processing over high topographical steps | Arnold, Markus et al. | 2017 |
| 5 | Spray-coatable negative photoresist for high topography MEMS applications | Arnold, Markus* et al. | 2017 |
| Anzahl der Ergebnisseiten: | 1 |
| Anzahl der Dokumente: | 5 |
