Ergebnis der Datenbankabfrage
Nr. | Titel | Autor | Jahr |
---|---|---|---|
1 | Towards knowledge-enhanced process models for semiconductor fabrication | Rothe, Tom et al. | 2023 |
2 | A Hybrid Chemical Mechanical Planarization (CMP) Model for Time-Dependent, Spatial Material Removal Rate Optimization | Rothe, Tom* et al. | 2022 |
3 | Automatic Analysis of CMP Dishing in Via Arrays from AFM Images | Langer, Jan* et al. | 2022 |
4 | Anisotropic transport properties of graphene-based conductor materials | Slawig, Diana et al. | 2021 |
Anzahl der Ergebnisseiten: | 1 |
Anzahl der Dokumente: | 4 |