Ergebnis der Datenbankabfrage
Nr. | Titel | Autor | Jahr |
---|---|---|---|
1 | Ruthenocenes and Half-Open Ruthenocenes: Synthesis, Characterization, andTheir Use as CVD Precursors for Ruthenium Thin Film Deposition | Tuchscherer, André et al. | 2012 |
2 | Thermal Stability and Sublimation Pressures of Some Ruthenocene Compounds | Siddiqi, M. Aslam et al. | 2010 |
3 | Copper Oxide ALD from a Cu(I) beta-Diketonate: Detailed Growth Studies on SiO2 and TaN | Waechtler, Thomas et al. | 2009 |
4 | Copper Oxide Films Grown by Atomic Layer Deposition from Bis(tri-n-butylphosphane)copper(I)acetylacetonate on Ta, TaN, Ru, and SiO2 | Waechtler, Thomas et al. | 2009 |
5 | Copper Oxide Films Grown by Atomic Layer Deposition from Bis(tri-n-butylphosphane)copper(I)acetylacetonate on Ta, TaN, Ru, and SiO2 | Waechtler, Thomas et al. | 2009 |
6 | Kupfer- und Ruthenium-Precursoren: Synthese, Charakterisierung und deren Verwendung zur Abscheidung metallischer Schichten nach dem CVD-Verfahren | Roth, Nina (Dipl.-Chem.) | 2009 |
7 | Phosphane copper(I) complexes as CVD precursors | Roth, Nina et al. | 2007 |
Anzahl der Ergebnisseiten: | 1 |
Anzahl der Dokumente: | 7 |