Ergebnis der Datenbankabfrage
| Nr. | Titel | Autor | Jahr |
|---|---|---|---|
| 1 | Low-temperature ALD of metallic cobalt using the CoCOhept precursor: Simulation-assisted process development for deposition on temperature sensitive 3D-structures | Franz, Mathias* et al. | 2025 |
| 2 | Machine learning in chemical-mechanical planarization: A comprehensive review of trends, applications, and challenges | Winkler, Georg* et al. | 2025 |
| 3 | Process and equipment modeling for chemical thin film deposition | Jäckel, Linda | 2025 |
| 4 | Real-Time Interfacial Pressure Prediction in CMP Using Machine Learning Surrogates of Finite Element Simulations | Rothe, Tom* et al. | 2025 |
| 5 | Surface chemistry models for low temperature Si epitaxy process simulation in a single-wafer reactor | Jäckel, Linda* et al. | 2024 |
| 6 | Multi-scale simulation of epitaxial processes | Jäckel, Linda* et al. | 2023 |
| Anzahl der Ergebnisseiten: | 1 |
| Anzahl der Dokumente: | 6 |
